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Model G5

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Combustion-type exhaust abatement system that offers highly efficient treatment of flammable gases and perfluorocarbons (PFCs)
  • Combustion-type exhaust abatement systems
  • Batch treatment of multiple gas types
  • Highly efficient abatement of PFCs
  • Byproduct removal measures/automatic removal of powdery byproducts
  • Low running cost
  • High up-time
  • On-demand operation to suit gas type and volume
  • Greater ease of maintenance
  • CE marking/SEMI-S2/NRTL available

Features and Benefits

The Model G5 range is a combustion-type exhaust abatement system that offers highly efficient abatement of many different gases used in manufacturing operations. Capable of batch treatment of multiple types of gases and of highly efficient treatment of PFCs, which are usually difficult to abate. With unique measures to remove byproducts and on-demand operation with variable fuel volume to suit the type and volume of gas being abated, Model G5 achieves reductions in running costs. Ideal for applications in the manufacturing operations of electric components such as semiconductors, LCD panels, solar cells, and LEDs, chemicals and materials manufacture, and research laboratories. Range includes large capacity models with flow rates of 1,200 L/min.

Specifications

 
Model Unit G5-350 A1~A4/P1~P4 G5-500 A1~A4/P1~P4 G5-600 A1~A4/P1~P4 G5-1200 A1~A4/P1~P4
Abatement method burn+ wet burn+ wet burn+ wet burn+ wet
Max. inflow gas volume L/min 350 500 600 1200
Fuel City gas or propane gas City gas or propane gas City gas or propane gas City gas or propane gas
Dimensions W x D x H mm 1,200 x 650 x 1,900 1,200 x 650 x 1,900 1,200 x 1,100 x 2,000 1,200 x 1,100 x 2,200
Gases (e.g.) Process (depo) gases
Cleaning gases, including
SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2
NF3, ClF3, HF, F2, HCl, COF2, etc.
Etching gases – all types
HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc.
PFCs
CF4, C2F6, C3F8, CHF3, SF6, etc.
Process (depo) gases
Cleaning gases, including
SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2
NF3, ClF3, HF, F2, HCl, COF2, etc.
Etching gases – all types
HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc.
PFCs
CF4, C2F6, C3F8, CHF3, SF6, etc.
Process (depo) gases
SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2
Cleaning gases - all types
NF3, ClF3, HF, F2, HCl, COF2, etc.
Etching gases – all types
HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc.
PFCs
CF4, C2F6, C3F8, CHF3, SF6, etc.
Process (depo) gases
SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2
Cleaning gases - all types
NF3, ClF3, HF, F2, HCl, COF2, etc.
Etching gases – all types
HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc.
PFCs
CF4, C2F6, C3F8, CHF3, SF6, etc.
Standard equipment Burner scraper for powder removal Burner scraper for powder removal Burner scraper for powder removal Burner scraper for powder removal
Options City water/drainage consumption reduction unit City water/drainage consumption reduction unit City water/drainage consumption reduction unit City water/drainage consumption reduction unit

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