Name: Model TND
Availability: InStock

Model TND

Category: Gas Abatement Systems

Quantity:

EBARA Semiconductor Manufacturing Equipment

EBARA Exhaust Abatement System

EBARA Combustion-Type Exhaust Abatement System

Model G-WS

Model GT

Combustion-type exhaust abatement system with low NOx emissions and abundant reaction byproduct measures for reduced maintenance costs.

Combustion-type exhaust abatement systems
Low NOx and low CO emissions
Batch treatment of multiple gas types
Highly efficient abatement of PFCs
Byproduct removal measures/automatic removal of powdery byproducts
Wet-burn-wet model available
Long maintenance intervals
Low running cost

Features and Benefits

The Model TND range is a combustion-type exhaust abatement system that uses a unique combustion system to achieve low NOx and low CO emissions. A variety of corrosion and byproduct countermeasures achieves maintenance intervals that are three times longer than conventional products. Lower cost operation is also possible with the low utility consumption that provides reduced running costs. The range includes the Model TND-Single (burn+ wet) and the Model TND-Single Plus (wet + burn + wet). This range achieves low running costs and highly efficient abatement even for processes with high byproduct generation.

Specifications

Model	Unit	TND-Single A1-A4/ TND-Single P1~P4	TND-Single Plus-A1~A4/P1~P4
Abatement method		burn+ wet	wet + burn + wet
Max. inflow gas volume	L/min	200(per port）	200(per port）
Max. inflow gas volume	L/min	400(per burner）	400(per burner）
Fuel		City gas or propane gas	City gas or propane gas
Dimensions	W x D x H mm	1,200 x 650 x 1,980	1,200 x 650 x 1,980
Gases (e.g.)		Process (depo) gases SiH4, PH3, GeH4, AsH3, NH3, SiH2Cl2, B2H6, H2, PH3, Si3H8, etc. Cleaning gases - all types NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc.	Process (depo) gases WF6, TiCl4, SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2, etc. Cleaning gases - all types NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc.
Standard equipment		Washing mechanism for powder removal	Powder filtering mechanism
Standard equipment		Burner scraper for powder removal	Burner scraper for powder removal
Options		City water/drainage consumption reduction unit	City water/drainage consumption reduction unit
Options		Fan scrubber for reduction of powder emissions	Fan scrubber for reduction of powder emissions